Institute of Microscale Optoelectronics, International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China
MIIT Key Laboratory of Advanced Display Materials and Devices, College of Material Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, China
Institute for Lasers, Photonics, and Biophotonics and Department of Chemistry, University at Buffalo, The State University of New York, Buffalo, NY 14260, USA
*Paras N. Prasadpnprasad@buffalo.edu
Han Zhanghzhang@szu.edu.cn
纸质出版日期:2022-12,
网络出版日期:2022-06-06,
收稿日期:2022-03-04,
修回日期:2022-04-10,
录用日期:2022-04-18
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In-situ neutron-transmutation for substitutional doping in 2D layered indium selenide based phototransistor[J]. 光:快讯(英文), 2022,2(1).
Zhinan Guo, Yonghong Zeng, Fanxu Meng, et al. In-situ neutron-transmutation for substitutional doping in 2D layered indium selenide based phototransistor[J]. eLight, 2022,2(1).
In-situ neutron-transmutation for substitutional doping in 2D layered indium selenide based phototransistor[J]. 光:快讯(英文), 2022,2(1). DOI: 10.1186/s43593-022-00017-z.
Zhinan Guo, Yonghong Zeng, Fanxu Meng, et al. In-situ neutron-transmutation for substitutional doping in 2D layered indium selenide based phototransistor[J]. eLight, 2022,2(1). DOI: 10.1186/s43593-022-00017-z.
Neutron-transmutation doping (NTD) has been demonstrated for the first time in this work for substitutional introduction of tin (Sn) shallow donors into two-dimensional (2D) layered indium selenide (InSe) to manipulate electron transfer and charge carrier dynamics. Multidisciplinary study including density functional theory
transient optical absorption
and FET devices have been carried out to reveal that the field effect electron mobility of the fabricated phototransistor is increased 100-fold due to the smaller electron effective mass and longer electron life time in the Sndoped InSe. The responsivity of the Sn-doped InSe based phototransistor is accordingly enhanced by about 50 times
being as high as 397 A/W. The results show that NTD is a highly effective and controllable doping method
possessing good compatibility with the semiconductor manufacturing process
even after device fabrication
and can be carried out without introducing any contamination
which is radically different from traditional doping methods.
Neutron-transmutation dopingSubstitutional dopingTwo-dimensional materialsPhototransistor
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